| Semiconductors & Semiconductor Equipment Industry | Information Technology Sector | Mr. Osamu Tsuji CEO | JPX Exchange | JP3322950001 ISIN |
| Japan Country | 175 Employees | 30 Jul 2026 Last Dividend | 27 Jul 2011 Last Split | - IPO Date |
SAMCO Inc. is a globally recognized semiconductor and materials company, with a strong presence in the field of thin film deposition, microfabrication, cleaning, and surface treatment technologies. Originally known as SAMCO International, Inc., the company underwent a name change to SAMCO Inc. in December 2004. Founded in 1979, the organization has established its headquarters in Kyoto, Japan. Over the years, SAMCO Inc. has dedicated itself to providing advanced equipment solutions, catering to the growing demands of the semiconductor industry and beyond.
SAMCO Inc. offers a diverse range of deposition systems, including Atomic Layer Deposition (ALD) systems, Plasma Enhanced Chemical Vapor Deposition (PECVD) systems, Liquid Source CVD systems, and Diamond-Like Carbon Coating systems. These systems are designed for the precise deposition of thin films over various substrates, catering to semiconductor manufacturing, surface coating, and material research applications.
The company's etching equipment portfolio includes Inductively Coupled Plasma (ICP), Silicon Deep Reactive Ion, Reactive Ion, and Xenon Difluoride etching systems. These systems are engineered to provide high-precision etching capabilities, essential for the fabrication of microelectronic components, semiconductors, and nanotechnology devices.
Under plasma processing, SAMCO Inc. showcases the Aqua Plasma cleaner, known for its ability to efficiently clean and prepare surfaces for further processing. This is complemented by an array of plasma and UV ozone cleaners, designed to remove organic contaminants and enhance surface wettability, crucial steps in device fabrication and research settings.