Advanced Micro-Fabrication Equipment Inc. (688012)

Overview

Advanced Micro-Fabrication Equipment Inc. China is at the forefront of semiconductor and pan-semiconductor equipment manufacturing within the Chinese market. Founded in 2004 and based in Shanghai, the company is dedicated to the research and development, manufacture, and sale of high-end equipment pivotal for the semiconductor industry. Its focus on innovation and technological advancement has positioned it as a key player in the field, ensuring the production of components essential to a wide array of electronic devices.

Products and Services

• Capacitive Plasma Etching Equipment: This equipment specializes in the etching of dielectric materials, including silicon oxide and nitride. It is used extensively in the semiconductor manufacturing process to create precision patterns on substrates.
• Inductive Plasma Etching Equipment: Engineered for the etching of single crystal silicon and polycrystalline silicon materials, this equipment plays a critical role in the fabrication of semiconductor devices, offering high precision and efficiency.
• Deep Silicon Etching Equipment: Similar to the inductive plasma etching equipment, this is specifically designed for deep etching in single crystal silicon and polycrystalline silicon, pivotal for creating structures with high aspect ratios required in various semiconductor applications.
• MOCVD Equipment: Metal-Organic Chemical Vapor Deposition (MOCVD) equipment is essential for the deposition of very thin layers of material onto semiconductor wafers. This process is crucial for the production of LED lights, solar cells, and high-speed and high-power electronics.
• LPCVD Equipment: Low-Pressure Chemical Vapor Deposition (LPCVD) equipment is utilized for depositing films and coatings on semiconductor materials. This process is key for manufacturing NAND contact holes and metal tungsten wires, which are integral components of memory and logic devices.
• VOC Equipment: This equipment is designed for the treatment and reduction of Volatile Organic Compounds during the semiconductor manufacturing process. Its use ensures compliance with environmental regulations and contributes to the sustainability efforts of the industry.