Grandit Co., Ltd. (688549)

Overview

GrandiT Co., Ltd. is a key player in the electronic chemical materials industry, focusing on the research, development, production, and marketing of a wide range of products specifically designed to meet the demands of the semiconductor industry in China. Founded in 2017, the company has rapidly established itself as a pivotal supplier within the sector, boasting a comprehensive portfolio of high-purity chemical products. Headquartered in Quzhou, China, GrandiT is recognized for its commitment to quality and innovation in creating solutions that enhance the performance and efficiency of semiconductor manufacturing processes.

Products and Services

• Electronic Grade Hydrofluoric Acid

  Used in the cleaning and etching processes of semiconductor manufacturing, providing essential qualities for the preparation of silicon surfaces.

• Electronic Grade Sulfuric Acid

  Plays a crucial role in cleaning semiconductor components, ensuring the removal of organic residues and contaminants.

• Electronic Grade Nitric Acid

  Key for nitration and oxidation processes, it is instrumental in various stages of semiconductor device fabrication.

• Electronic Grade Hydrochloric Acid

  Utilized in the etching of semiconductor materials and cleaning of silicon wafers, vital for achieving desired surface properties.

• Electronic Grade Ammonia

  Applied in the deposition of silicon nitride layers, it is essential for the production of semiconductors, offering high purity for critical manufacturing steps.

• Buffered Oxide Etchant

  An etching solution designed for precision work on silicon wafers, enabling controlled etching rates for manufacturing accuracy.

• Poly Etchant

  Used for etching polysilicon layers, this chemical ensures the precise patterning required in semiconductor device fabrication.

• High Purity Chlorine

  Essential for the production of various semiconductor devices, it is used in doping processes and etching, providing the necessary purity for high-quality outcomes.

• High Purity Hydrogen Chloride

  Key for gas phase etching and cleaning of semiconductor materials, offering the high purity required for advanced semiconductor manufacturing processes.

• High Purity Tungsten Hexafluoride

  Utilized in the deposition of tungsten, necessary for the creation of integrated circuits and as a barrier material in semiconductor manufacturing.

• High Purity Fluorine-based Gases

  Used in plasma etching and chemical vapor deposition processes, these gases are critical for the patterning and fabrication of semiconductor devices.

• Precursors

  Essential for the deposition of thin films via chemical vapor deposition (CVD) and atomic layer deposition (ALD), playing a crucial role in the manufacturing of semiconductor devices.