| Semiconductors & Semiconductor Equipment Industry | Information Technology Sector | Ms. Jing Liu CEO | SSE Exchange | CNE100005998 ISIN |
| CN Country | 1,070 Employees | 4 Jun 2026 Last Dividend | 28 Sep 2023 Last Split | - IPO Date |
Piotech Inc., established in 2010, stands as a key player in the high-end semiconductor equipment sector within China. This enterprise dedicates its efforts towards the research and development, manufacturing, sales, and provision of technical services related to special semiconductor equipment. With its headquarters based in Shenyang, China, Piotech Inc. has carved a niche for itself by focusing on the development and provision of cutting-edge thin film equipment and hybrid bonding technology, which play crucial roles in the fabrication of integrated circuits and wafer-level three-dimensional integration. The company's expertise and innovative solutions serve the ever-evolving needs of the semiconductor industry, especially in the manufacturing of logic chips, memory chips, and other semiconductors that are integral to modern technology.
This range of equipment utilizes plasma to facilitate chemical reactions at lower temperatures, enabling the deposition of various types of thin films. These are essential in the manufacturing processes of integrated circuit logic chips and memory chips.
ALD equipment is designed for the deposition of nanometer-thin films, allowing for precise control over thickness and composition. This technology is critical for fabricating high-quality semiconductor devices with enhanced performance and reliability.
SACVD equipment is specialized for depositing films under sub-atmospheric pressure conditions. This technique is particularly beneficial for creating layers with specific properties, necessary for advanced semiconductor fabrication.
HDPECVD technology boosts the plasma density during the deposition process, improving the quality and uniformity of thin films. This equipment is vital for manufacturing lines that require high precision and efficiency.
This type of equipment is utilized in the field of wafer-level three-dimensional integration. Hybrid bonding technology enables the direct bonding of wafers, a method that significantly enhances the performance and functionality of semiconductor devices by allowing for more compact and efficient designs.